Available for controlling liquid precursors to vaporizing systems for CVD chambers, Vapor Delivery Module is available to realize mass flow control of vapors as based on combination of gas and liquid flow meters. It can be applied for atmospheric, pressurized, and vacuum processes, vaporizing liquid flows from 0.25 to ~1,200 g/h depending on fluid and process conditions. Vaporizers suit vapor deposition and coating processes for production of semiconductor chips, displays, and solar cells.
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